Atomic Layer Deposition (ALD) belongs to the family of chemical vapor deposition methods (CVD).
It is a deposition process of a coating at a nano-scale level within a vacuum chamber.
The deposition process forms ultra-thin films (atomic layers) of coating with extremely reliable film thickness control.
This provides for highly conformal and dense films at extremely thin layers (1-100nm).
ALD is used in many different areas including:
- Fuel cell systems
Find out more here by clicking what is atomic layer deposition?
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